Title:
SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2013/179676
Kind Code:
A1
Abstract:
A sputtering target which is formed of an oxide sintered body that contains indium element, tin element and zinc element. The oxide sintered body contains a spinel structure compound represented by Zn2SnO4 and one or more compounds that are selected from among hexagonal lamellar compounds represented by In2O3(ZnO)m, hexagonal lamellar compounds represented by InXO3(ZnO)n, rutile structure compounds represented by SnO2 and ilmenite structure compounds represented by ZnSnO3, with agglomerates of the spinel structure compound being 5% or less of the whole. (In the formulae, X represents a metal element that is capable of forming a hexagonal lamellar compound together with indium element and zinc element; m represents an integer of 1 or more; and n represents an integer of 1 or more.)
Inventors:
NISHIMURA MAMI (JP)
MATSUZAKI SHIGEO (JP)
OHYAMA MASASHI (JP)
MATSUZAKI SHIGEO (JP)
OHYAMA MASASHI (JP)
Application Number:
PCT/JP2013/003445
Publication Date:
December 05, 2013
Filing Date:
May 31, 2013
Export Citation:
Assignee:
IDEMITSU KOSAN CO (JP)
NISHIMURA MAMI (JP)
MATSUZAKI SHIGEO (JP)
OHYAMA MASASHI (JP)
NISHIMURA MAMI (JP)
MATSUZAKI SHIGEO (JP)
OHYAMA MASASHI (JP)
International Classes:
C23C14/34; C04B35/453
Domestic Patent References:
| WO2007037191A1 | 2007-04-05 | |||
| WO2001056927A1 | 2001-08-09 | |||
| WO2001038599A1 | 2001-05-31 | |||
| WO2010058533A1 | 2010-05-27 | |||
| WO2010007989A1 | 2010-01-21 |
Foreign References:
| JP2006165532A | 2006-06-22 | |||
| JP2010037161A | 2010-02-18 |
Attorney, Agent or Firm:
WATANABE, Kihei et al. (JP)
Kihei Watanabe (JP)
Kihei Watanabe (JP)
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