Title:
STAGE DEVICE AND STAGE CONTROL SYSTEM
Document Type and Number:
WIPO Patent Application WO/2013/011711
Kind Code:
A1
Abstract:
[Problem] To make positioning on the order of 1 nm possible using a universal servo amp and without using a linear amp. [Solution] The stage device (3) is provided with: two guide rails (12) having guiding surfaces; a slider (13), which has guided surfaces that correspond to the guiding surfaces and the movement direction of which is controlled by the guide rails (12); a linear motor (16) that generates the thrust of the slider (13); and a linear scale (17) that detects the position of the slider (13). The state of lubrication between the guiding surfaces and guided surfaces is controlled so as to be a mixed lubrication state comprising both boundary film lubrication and fluid film lubrication in at least one area, and to be a fluid film lubrication state in the other areas.
Inventors:
KOIKE HARUHIKO (JP)
KAKU YASUHIKO (JP)
KAKU YASUHIKO (JP)
Application Number:
PCT/JP2012/054883
Publication Date:
January 24, 2013
Filing Date:
February 28, 2012
Export Citation:
Assignee:
YASKAWA DENKI SEISAKUSHO KK (JP)
KOIKE HARUHIKO (JP)
KAKU YASUHIKO (JP)
KOIKE HARUHIKO (JP)
KAKU YASUHIKO (JP)
International Classes:
B23Q1/26; B23Q1/38; F16C32/06; H01L21/027; H01L21/68
Foreign References:
| JP2004036680A | 2004-02-05 | |||
| JP2000337375A | 2000-12-05 | |||
| JPS63216656A | 1988-09-08 |
Attorney, Agent or Firm:
MASUDA HIROFUMI (JP)
Hirofumi Masuda (JP)
Hirofumi Masuda (JP)
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Claims:
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