STAGE, AND METHOD FOR MANUFACTURING STAGE

Title:

STAGE, AND METHOD FOR MANUFACTURING STAGE

Document Type and Number:

WIPO Patent Application WO/2020/179539

Kind Code:

A1

Abstract:

A stage including: a base material which has a first surface and a second surface located adjacent to the first surface; and an insulation film which contains a plurality of particles each having a flat surface wherein a portion of the flat surface is arranged along the first surface and the second surface. In the stage, the base material also includes a third surface that is located in a direction opposed by a 180-degree angle to the first surface, and the insulation film is so arranged that a portion of the flat surface can be arranged along the third surface and a surface formed by extending the first surface and a surface formed by extending the second surface can intersect each other at a 90-degree angle. It is also possible that the base material includes a third surface in a direction opposed by a 180-degree angle to the first surface and the insulation film is so arranged that a portion of the flat surface can be arranged along the third surface.

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Inventors:

HANAMACHI TOSHIHIKO (JP)
MOROTA SHUHEI (JP)
TAKIMOTO MASARU (JP)
ARAKI YOSHIHITO (JP)
YOKOYAMA HIBIKI (JP)
FUJII MASAHIRO (JP)

Application Number:

PCT/JP2020/007433

Publication Date:

September 10, 2020

Filing Date:

February 25, 2020

Export Citation:

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Assignee:

NHK SPRING CO LTD (JP)

International Classes:

C23C4/12; H01L21/3065; H01L21/683

Foreign References:

JP2019016697A	2019-01-31
US20050193951A1	2005-09-08
US20040190215A1	2004-09-30
JPS6027407B2	1985-06-28
JP2600558Y2	1999-10-12

Other References: