STAMP FOR MICROPATTERN TRANSFER

WIPO Patent Application WO/2011/118289

A1

Disclosed is a stamp (3)—that is for micropattern transfer and that has a microstructure layer (2) on a supporting substrate (1)—characterized by the aforementioned microstructure layer (2) being a polymer of a resin composition primarily containing: a silsesquioxane derivative having a plurality of polymerizable functional groups; and one or a plurality of types of monomer components having a plurality of polymerizable functional groups.

JP63214412	PREPARATION OF MASTER-PATTERN MOLD
JP2011192868	METHOD OF PROCESSING TEMPLATE, PROGRAM, COMPUTER STORAGE MEDIUM, AND TEMPLATE PROCESSING DEVICE
JP01217739	STAMPER FOR OPTICAL DISK

ISHII Satoshi (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
石井　聡之 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)
OGINO Masahiko (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
荻野　雅彦 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)
SHIZAWA Noritake (1600 Kami, Kamisato-machi, Kodama-gu, Saitama 95, 〒3690395, JP)

JP2011/053216

September 29, 2011

February 16, 2011

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HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
ISHII Satoshi (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
石井　聡之 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)
OGINO Masahiko (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
荻野　雅彦 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)

B29C33/38; B29C59/02; G11B5/84; G11B7/26; H01L21/027

ISONO Michizo (Sabo Kaikan Annex 7-4, Hirakawa-cho 2-chome, Chiyoda-k, Tokyo 93, 〒1020093, JP)

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