Title:
STEREOLITHOGRAPHY APPARATUS, STEREOLITHOGRAPHY PROGRAM, AND STEREOLITHOGRAPHY METHOD
Document Type and Number:
WIPO Patent Application WO/2019/124526
Kind Code:
A1
Abstract:
In the stereolithography apparatus according to the present invention, a measurement unit measures the temperature of a photocurable liquid resin by means of a temperature sensor. A setting unit sets an integrated light amount on the basis of temperature information obtained from the measured temperature and curing information stored in a storage unit, and a radiation unit controls a projector such that the photocurable liquid resin is irradiated with light with which the set integrated light amount can be obtained. As a result, the photocurable liquid resin is irradiated with light of the integrated light amount that corresponds to the temperature of the photocurable liquid resin, thereby enabling a molded object to be molded with high precision.
Inventors:
SAKAMAKI TOSHIKAZU (JP)
SHIODE HIROHISA (JP)
HAYASHI TAKAAKI (JP)
SHIODE HIROHISA (JP)
HAYASHI TAKAAKI (JP)
Application Number:
PCT/JP2018/047115
Publication Date:
June 27, 2019
Filing Date:
December 20, 2018
Export Citation:
Assignee:
MITSUI CHEMICALS INC (JP)
International Classes:
B29C64/393; B29C64/124; B33Y10/00; B33Y40/00; B33Y50/02
Domestic Patent References:
WO2018062002A1 | 2018-04-05 | |||
WO2006035739A1 | 2006-04-06 | |||
WO2018061993A1 | 2018-04-05 | |||
WO2018061996A1 | 2018-04-05 |
Foreign References:
JP2008201135A | 2008-09-04 | |||
JP2005131938A | 2005-05-26 | |||
JP2017243513A | 2017-12-20 |
Other References:
See also references of EP 3711929A4
Attorney, Agent or Firm:
NAKAJIMA, Jun et al. (JP)
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