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Patent Searching and Data


Title:
STRIPPING AGENT AGAINST RESIST RESIDUES
Document Type and Number:
WIPO Patent Application WO/2000/034996
Kind Code:
A1
Abstract:
A nonpoisonous, nondeleterious and nondangerous stripping agent against resist residues which makes it possible to strip resist residues safely without causing problems such as corrosion of metal, being an aqueous solution containing ammonium phosphate and/or a condensed ammonium phosphate and having a pH of 1 to 10.

Inventors:
YATA TAKASHI (JP)
TERAYAMA SHIGEKI (JP)
KOINUMA YUTAKA (JP)
OHGUSHI TAKERU (JP)
Application Number:
PCT/JP1999/006915
Publication Date:
June 15, 2000
Filing Date:
December 09, 1999
Export Citation:
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Assignee:
KISHIMOTO SANGYO CO (JP)
YATA TAKASHI (JP)
TERAYAMA SHIGEKI (JP)
KOINUMA YUTAKA (JP)
OHGUSHI TAKERU (JP)
International Classes:
H01L21/302; G03F7/42; H01L21/027; H01L21/304; H01L21/3065; H01L21/308; H01L21/311; (IPC1-7): H01L21/308; G03F7/42; H01L21/027; H01L21/304
Foreign References:
JPS6415740A1989-01-19
JPS5724540A1982-02-09
US5292626A1994-03-08
JPH06118660A1994-04-28
Other References:
See also references of EP 1063689A4
Attorney, Agent or Firm:
Ishii, Yoichi (Yushima 3-chome Bunkyo-ku Tokyo, JP)
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