Title:
STRUCTURE, PRODUCTION METHOD THEREFOR, AND ARTICLE PROVIDED WITH SAID STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2015/041283
Kind Code:
A1
Abstract:
The present invention relates to a structure provided with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, said structure wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (∆µ) of the rate of change of the coefficient of kinetic friction of the surface of the structure is 0.15-1.05, said ratio being represented by formula (1), namely ∆µ=∆µf/∆µs (in formula (1): ∆µs represents the rate of change of the coefficient of kinetic friction of the surface of the structure at an initial-abrasion stage of a reciprocating abrasion test; and ∆µf represents the rate of change of the coefficient of kinetic friction of the surface of the structure immediately prior to the end of the reciprocating abrasion test). According to the present invention, a structure exhibiting excellent scratch resistance without compromising on the optical performance thereof, such as the anti-reflection performance thereof, a production method for said structure, and an article provided with said structure can be provided.
Inventors:
MORI SEIICHIRO (JP)
FUJIYAMA KOUSUKE (JP)
OTANI GO (JP)
NAKAI YUSUKE (JP)
JIGAMI TETSUYA (JP)
FUJIYAMA KOUSUKE (JP)
OTANI GO (JP)
NAKAI YUSUKE (JP)
JIGAMI TETSUYA (JP)
Application Number:
PCT/JP2014/074662
Publication Date:
March 26, 2015
Filing Date:
September 18, 2014
Export Citation:
Assignee:
MITSUBISHI RAYON CO (JP)
International Classes:
G02B1/11; B32B7/02
Domestic Patent References:
| WO2011155499A1 | 2011-12-15 | |||
| WO2012099164A1 | 2012-07-26 |
Foreign References:
| JP2013039711A | 2013-02-28 | |||
| JP2009031764A | 2009-02-12 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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