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Title:
SUBMERGED PLASMA GENERATION DEVICE AND LIQUID TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/221325
Kind Code:
A1
Abstract:
A submerged plasma generation device that generates plasma in gas supplied into a liquid, wherein plasma that is stabilized with high efficiency is generated. A submerged plasma generation device 3 comprises: a housing 31 that holds a liquid in an internal space; a gas supply tube 32 having an opening inside the internal space, the gas supply tube 32 discharging the gas into the liquid from the opening; a first electrode 34 that projects from the gas supply tube 32 into the internal space through the opening, and has a structure in which a conductor part 341 of the protruding area is covered by a dielectric 342; a second electrode 36 provided surrounding the protruding area of the first electrode 34, the second electrode 36 having a conductor part that is separated from the liquid by the dielectric; and a voltage application part 4 that applies a voltage between the first electrode 34 and the second electrode 36, the space between the protruding area and the second electrode 36 being a flow channel through which the gas discharged from the opening passes.

Inventors:
HORIKOSHI AKIRA (JP)
NAKAMURA SHOHEI (JP)
TAKATSUJI SHIGERU (JP)
KONO MOTOHIRO (JP)
Application Number:
PCT/JP2018/019694
Publication Date:
December 06, 2018
Filing Date:
May 22, 2018
Export Citation:
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Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H05H1/24; B01J19/08
Foreign References:
JP2015116561A2015-06-25
JPH08266889A1996-10-15
JP2000228298A2000-08-15
JP2008178870A2008-08-07
JP2012011301A2012-01-19
US20040050682A12004-03-18
Attorney, Agent or Firm:
FURIKADO, Shoichi et al. (JP)
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