Title:
SUBSTANCE SUPERCRITICAL TREATMENT METHOD AND DEVICE, AND SEMICONDUCTOR DEVICE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2023/024001
Kind Code:
A1
Abstract:
Provided in the present invention are a substance supercritical treatment method and device, and a semiconductor device treatment method. The substance supercritical treatment method comprises: providing a first substance and a second substance; acquiring the first substance in a supercritical state; and treating the second substance by using the first substance in the supercritical state, so as to obtain the second substance in a supercritical state. It can be seen that the supercritical treatment of a second substance itself can be realized by means of the effect of a first substance in a supercritical state without the need to separately perform supercritical treatment including heating and pressurization. Therefore, for example, the supercritical treatment, in a low-concentration state, of a flammable, explosive and toxic substance in a high-concentration state can be realized by means of the solution, and the supercritical treatment of a substance with high critical temperature and pressure can also be realized by means of the solution, thereby solving the problems of existing supercritical treatment technology having single means and there being many limitation conditions.
Inventors:
CHANG KUANCHANG (CN)
LI LEI (CN)
LIU KAI (CN)
LI LEI (CN)
LIU KAI (CN)
Application Number:
PCT/CN2021/114642
Publication Date:
March 02, 2023
Filing Date:
August 26, 2021
Export Citation:
Assignee:
UNIV PEKING SHENZHEN GRADUATE SCHOOL (CN)
International Classes:
B01D11/02
Foreign References:
| CN108251093A | 2018-07-06 | |||
| CN1557520A | 2004-12-29 | |||
| CN101190438A | 2008-06-04 | |||
| CN108305828A | 2018-07-20 | |||
| JP2005223118A | 2005-08-18 |
Attorney, Agent or Firm:
DHC IP ATTORNEYS (CN)
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