SUBSTITUTED ACETOPHENONE COMPOUND, PROCESS FOR PRODUCING SAME, AND USE OF SAME

WIPO Patent Application WO/2010/027051

A1

Disclosed is a novel intermediate for producing a substituted isoxazoline compound that is useful as a harmful organism control agent. Specifically disclosed are: a substituted acetophenone compound represented by general formula (1) or (2) [wherein A1, A2, A3 and A4 independently represent C-Y or a nitrogen atom; W represents an oxygen atom or a sulfur atom; X1 represents a halogen atom or a trifluoromethyl; X2 represents a chlorine atom, a bromine atom or an iodine atom; X3 represents a hydrogen atom or a halogen atom; provided that X3 represents a halogen atom when X1 represents a fluorine atom, a bromine atom or an iodine atom, and X3 represents a fluorine atom, a bromine atom or an iodine atom when X1 represents a chlorine atom; Y represents a hydrogen atom, a halogen atom, a cyano, a nitro, a methyl, or the like; R represents a halogen atom, provided that R represents a chlorine atom, a bromine atom or an iodine atom when X1 represents a trifluoromethyl and X2 represents a chlorine atom; R1 represents a C2-C4 alkyl, a C1-C4 haloalkyl, a (C1-C2)alkyl which is optionally substituted by R6, a cyclopropyl, a tetrahydrofuryl, -N(R11)R10, or the like; R2 represents a hydrogen atom, a methyl, an ethyl, a methoxymethyl, a cyanomethyl, an allyl, a propargyl, or the like; R3 represents a hydrogen atom, a cyano, a methyl, or the like; R6 represents a C3-C4 cycloalkyl, -S(O)pR16, or the like; R10 represents a C1-C3 alkyl, a C1-C3 haloalkyl, a cyclopropyl, an allyl, a propargyl, or the like; R11 represents a hydrogen atom, or the like; R16 represents a methyl, an ethyl, or the like; and p represents an integer of 0 to 2]; a process for producing the substituted acetophenone compound; and use of the substituted acetophenone compound as an intermediate for the production of a substituted isoxazoline compound.

MITA TAKESHI (JP)
IKEDA EITATSU (JP)
TOYAMA KENICHI (JP)
YAMADA YOKO (JP)
IWASA MOTOYOSHI (JP)
MAEDA KAZUSHIGE (JP)

PCT/JP2009/065510

March 11, 2010

September 04, 2009

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NISSAN CHEMICAL IND LTD (JP)
MITA TAKESHI (JP)
IKEDA EITATSU (JP)
TOYAMA KENICHI (JP)
YAMADA YOKO (JP)
IWASA MOTOYOSHI (JP)
MAEDA KAZUSHIGE (JP)

C07C233/31; C07C255/29; C07C317/44; C07C323/60; C07D261/04; C07D413/12; C07D417/12

WO2009035004A1	2009-03-19
WO2009005015A1	2009-01-08
WO2007105814A1	2007-09-20
WO2005085216A1	2005-09-15

JP2008260691A	2008-10-30
JP2007308471A	2007-11-29

HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)

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