SUBSTRATE CARRIER WITH MULTIPLE EMISSIVITY COEFFICIENTS FOR THIN FILM PROCESSING

WIPO Patent Application WO/2012/122253

A3

Substrate carrier having multiple emissivity coefficients for thin film processing and more particularly for support of a substrate during a deposition process epitaxially growing a film on the substrate. A front side of the carrier has a first carrier surface upon which the substrate is to be disposed, the first carrier surface having a first emissivity coefficient different than a second emissivity coefficient of a second carrier surface adjacent to the first carrier surface. Selection of the second emissivity coefficient independent of the first emissivity coefficient may modify an amount of energy radiated from the second carrier surface during processing of the substrate. In one embodiment, the second carrier surface has a second emissivity coefficient which is lower than the first emissivity coefficient to reduce heat loss from the carrier surface while maintaining high efficiency energy transfer between the carrier and a substrate.

HUANG JUNO YU-TING (US)
SHRAUTI SURESH M (US)
DUBOUST ALAIN (US)
BOUR DAVID (US)
HSU WEI-YUNG (US)
CHEN LIANG-YUN (US)

PCT/US2012/028047

November 15, 2012

March 07, 2012

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APPLIED MATERIALS INC (US)
HUANG JUNO YU-TING (US)
SHRAUTI SURESH M (US)
DUBOUST ALAIN (US)
BOUR DAVID (US)
HSU WEI-YUNG (US)
CHEN LIANG-YUN (US)

H01L21/683; C23C16/458; H01L21/205

JP2005054244A	2005-03-03
JPH07194965A	1995-08-01
US20100055318A1	2010-03-04

VINCENT, Lester, J. et al. (Sokoloff Taylor & Zafman LLP,1279 Oakmead Parkwa, Sunnyvale CA, US)

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