Title:
SUBSTRATE CLEANING APPARATUS AND METHOD EMPLOYED THEREIN
Document Type and Number:
WIPO Patent Application WO/2010/050217
Kind Code:
A1
Abstract:
Provided is a substrate cleaning apparatus wherein a surface to be cleaned (1a) on the front side and a surface to be cleaned (1b) on the rear side of a side end section of a substrate (1) are cleaned by wiping surfaces (12a, 12b) of a cleaning tape (12). The substrate cleaning apparatus has: a pressing member (11a) which presses the cleaning tape (12) to the surface to be cleaned (1a); a pressing member (11b) which presses the cleaning tape (12) to the surface to be cleaned (1b); a tape path which passes between the pressing member (11a) and the surface to be cleaned (1a) and between the pressing member (11b) and the surface to be cleaned (1b); and a moving apparatus which relatively moves the cleaning tape (12) and the substrate (1) in the longitudinal direction of the side end section. The tape path makes the cleaning tape (12) pass between the pressing member (11a) and the surface to be cleaned (1a) in the direction orthogonally intersecting with the longitudinal direction of the side end section of the substrate (1) in a state where the wiping surface (12a) faces the surface to be cleaned (1a), and loops the cleaning tape so that the wiping surface (12b) faces the rear side of the substrate (1), then, makes the cleaning tape pass between the pressing member (11b) and the surface to be cleaned (1b) in the direction identical to the passing direction between the pressing member (11a) and the surface to be cleaned (1a) in a state where the wiping surface (12b) faces the surface to be cleaned (1b).
Inventors:
WATANABE, Masaya (())
渡邉雅也 (())
KOBAYASHI, Sakae (())
渡邉雅也 (())
KOBAYASHI, Sakae (())
Application Number:
JP2009/005738
Publication Date:
May 06, 2010
Filing Date:
October 29, 2009
Export Citation:
Assignee:
PANASONIC CORPORATION (1006, Oaza Kadoma Kadoma-sh, Osaka 01, 〒5718501, JP)
パナソニック株式会社 (〒01 大阪府門真市大字門真1006番地 Osaka, 〒5718501, JP)
WATANABE, Masaya (())
渡邉雅也 (())
パナソニック株式会社 (〒01 大阪府門真市大字門真1006番地 Osaka, 〒5718501, JP)
WATANABE, Masaya (())
渡邉雅也 (())
International Classes:
B08B1/00
Attorney, Agent or Firm:
TANAKA, Mitsuo et al. (AOYAMA & PARTNERS, IMP Building 3-7, Shiromi 1-chome, Chuo-ku, Osaka-sh, Osaka 01, 〒5400001, JP)
Download PDF:
Previous Patent: MOTION CONTENT GENERATION SYSTEM
Next Patent: MEMBRANE ELECTRODE ASSEMBLY AND FUEL CELL
Next Patent: MEMBRANE ELECTRODE ASSEMBLY AND FUEL CELL
