Title:
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2011/052111
Kind Code:
A1
Abstract:
Disclosed is a substrate cleaning device provided with: a generation unit that generates ozone micro-nanobubble water; a nozzle header unit provided with a plurality of spray nozzles that spray the ozone micro-nanobubble water; and a substrate support unit that supports a substrate being treated. The surface of the substrate supported by the substrate support unit is cleaned by spraying the ozone micro-nanobubble water from the plurality of spray nozzles onto the substrate.
Inventors:
TANAKA, Junichi (())
田中潤一 (())
田中潤一 (())
Application Number:
JP2010/003315
Publication Date:
May 05, 2011
Filing Date:
May 17, 2010
Export Citation:
Assignee:
SHARP KABUSHIKI KAISHA (22-22, Nagaike-cho Abeno-ku, Osaka-sh, Osaka 22, 〒5458522, JP)
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町２２番２２号 Osaka, 〒5458522, JP)
TANAKA, Junichi (())
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町２２番２２号 Osaka, 〒5458522, JP)
TANAKA, Junichi (())
International Classes:
H01L21/304; B08B3/02; B08B3/08; G03F7/42; H01L21/027
Attorney, Agent or Firm:
MAEDA, Hiroshi et al. (Osaka-Marubeni Bldg, 5-7 Hommachi 2-chome, Chuo-ku, Osaka-sh, Osaka 53, 〒5410053, JP)
Previous Patent: INFORMATION PROCESSING DEVICE
Next Patent: SYSTEM CLOCK MONITORING DEVICE, AND MOTOR CONTROL SYSTEM
Next Patent: SYSTEM CLOCK MONITORING DEVICE, AND MOTOR CONTROL SYSTEM