Title:
SUBSTRATE CLEANING METHOD, METHOD FOR CREATING SUBSTRATE CLEANING RECIPE, AND DEVICE FOR CREATING SUBSTRATE CLEANING RECIPE
Document Type and Number:
WIPO Patent Application WO/2018/056038
Kind Code:
A1
Abstract:
Provided is a substrate cleaning method for cleaning a substrate having an oxide film on a surface thereof. This method comprises: a partial etching step for etching the oxide film to a predetermined film thickness; and, after the partial etching step, a physical cleaning step for executing physical cleaning with respect to the surface of the substrate. The oxide film may be a native oxide film that has taken in particles at least partially. In this case, the partial etching step may be a step for exposing the particles from the native oxide film or for increasing portions exposed from the native oxide film. The physical cleaning may be a step for removing, by a physical action, the particles exposed from the native oxide film while leaving the native oxide film on the surface of the substrate.
Inventors:
HIGUCHI AYUMI (JP)
KOMORI KANA (JP)
KOMORI KANA (JP)
Application Number:
PCT/JP2017/031796
Publication Date:
March 29, 2018
Filing Date:
September 04, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304
Foreign References:
| JP2006278387A | 2006-10-12 | |||
| JPH0722365A | 1995-01-24 | |||
| JP2006203161A | 2006-08-03 | |||
| JP2014067936A | 2014-04-17 |
Attorney, Agent or Firm:
AI ASSOCIATION OF PATENT AND TRADEMARK ATTORNEYS (JP)
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