Title:
SUBSTRATE DRYING APPARATUS AND SUBSTRATE DRYING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/067033
Kind Code:
A1
Abstract:
A substrate drying apparatus is provided with a chamber (21) for drying a resist film formed on a substrate (61) positioned therein, and a transport mechanism (40) having a plurality of rotating rollers (41). The plurality of rotating rollers (41) are positioned at intervals from one another inside the chamber (21), and have the substrate (61) positioned thereon. The transport mechanism (40) transports the substrate (61) with the drive of the rotating rollers (41). While the resist film formed on the substrate (61) is being dried, the rotating rollers (41) are driven in a manner such that the substrate (61) moves back and forth repeatedly inside the chamber (21). As a result, it is possible to provide a substrate drying apparatus and substrate drying method with which uniform liquid film drying is achieved.
Inventors:
YAMAMOTO MASAYA
Application Number:
PCT/JP2011/076058
Publication Date:
May 24, 2012
Filing Date:
November 11, 2011
Export Citation:
Assignee:
SHARP KK (JP)
YAMAMOTO MASAYA
YAMAMOTO MASAYA
International Classes:
H01L21/027; F26B5/04; F26B15/12; G03F7/16
Foreign References:
| JP2004299850A | 2004-10-28 | |||
| JP2008053454A | 2008-03-06 | |||
| JP2000091181A | 2000-03-31 | |||
| JP2008311250A | 2008-12-25 | |||
| JP2008159782A | 2008-07-10 | |||
| JP2008124366A | 2008-05-29 |
Attorney, Agent or Firm:
Fukami Patent Office, p. c. (JP)
Patent business corporation Fukami patent firm (JP)
Patent business corporation Fukami patent firm (JP)
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