Title:
SUBSTRATE DRYING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2012/111618
Kind Code:
A1
Abstract:
Provided is a substrate drying apparatus with improved ability in drying the surface of a substrate after washing thereof. The substrate drying apparatus (1) is provided with a conveying unit (20) for conveying a substrate (10) comprising a front face (11) and a back face (12) in the face direction thereof, gas ejection sections (30) for ejecting and blowing gas onto the front face (11) and the back face (12), and heating units (40) for heating the gas ejected from the gas ejection sections (30).
Inventors:
SAITOH TAKAO
KAJI KENTAROH
KAJI KENTAROH
Application Number:
PCT/JP2012/053281
Publication Date:
August 23, 2012
Filing Date:
February 13, 2012
Export Citation:
Assignee:
SHARP KK (JP)
SAITOH TAKAO
KAJI KENTAROH
SAITOH TAKAO
KAJI KENTAROH
International Classes:
H01L21/304; F26B13/04
Foreign References:
| JP2004330180A | 2004-11-25 | |||
| JPH11204489A | 1999-07-30 | |||
| JP2006247020A | 2006-09-21 | |||
| JP2006222340A | 2006-08-24 | |||
| JP2009105447A | 2009-05-14 |
Attorney, Agent or Firm:
Fukami Patent Office, p. c. (JP)
Patent business corporation Fukami patent firm (JP)
Patent business corporation Fukami patent firm (JP)
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Claims:
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