Title:
SUBSTRATE DRYING METHOD AND SUBSTRATE DRYING DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/053988
Kind Code:
A1
Abstract:
The invention comprises: supplying a processing solution containing a sublimable substance onto the surface of a substrate whereon a liquid has been adhered, thereby forming a liquid film, and causing the liquid film to solidify, to yield a solidified body; and supplying a nitrogen gas to the solidified body formed on the surface of the substrate, in such a manner that the flow rate per unit surface area is constant for the entirety of the substrate surface. In the invention, the solidified body sublimates uniformly over the entirety of the substrate surface, and the gas-solid interface on the solidified body moves in an orthogonal direction relative to the substrate surface. In this manner, protruding portions from a pattern are not subjected to a pull by the movement of the gas-solid interface on the solidified body, thereby preventing a collapse of the pattern formed on the substrate surface, while allowing the surface to be dried suitably.
Inventors:
HANAWA YOSUKE (JP)
SASAKI YUTA (JP)
SASAKI YUTA (JP)
Application Number:
PCT/JP2018/023259
Publication Date:
March 21, 2019
Filing Date:
June 19, 2018
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
F26B3/04; H01L21/304; F26B21/00
Foreign References:
| JP2014011426A | 2014-01-20 | |||
| JP2010192878A | 2010-09-02 | |||
| JP2002012892A | 2002-01-15 | |||
| JP2005142461A | 2005-06-02 | |||
| JP2008246450A | 2008-10-16 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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