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Patent Searching and Data


Title:
SUBSTRATE DRYING METHOD AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/166136
Kind Code:
A1
Abstract:
A set concentration range that indicates the range of concentration of a sublimable substance that is set at least on the basis of the height of a pattern is checked. A starting solution that contains the sublimable substance and a solvent is stored in a starting solution tank. A diluted solution containing a solvent and having a concentration of the sublimable substance that is lower than the concentration of the sublimable substance in the starting solution is mixed with the starting solution outside the starting solution tank to create a pre-dry process liquid in which the concentration of the sublimable substance is within the set concentration range. A solidified film that contains the sublimable substance is formed on a surface of a substrate. The solidified film is sublimated to remove the solidified film from the surface of the substrate.

Inventors:
OTSUJI MASAYUKI (JP)
TAKAHASHI HIROAKI (JP)
KATO MASAHIKO (JP)
INOUE KAZUKI (JP)
FUJIWARA NAOZUMI (JP)
OKUTANI MANABU (JP)
YAMAGUCHI YU (JP)
SASAKI YUTA (JP)
Application Number:
PCT/JP2019/041171
Publication Date:
August 20, 2020
Filing Date:
October 18, 2019
Export Citation:
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Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304; F26B5/08
Domestic Patent References:
WO2018030516A12018-02-15
Foreign References:
JP2017139279A2017-08-10
JP2010239013A2010-10-21
JP2007242956A2007-09-20
JP2015119168A2015-06-25
JP2011029455A2011-02-10
JP2008130835A2008-06-05
JP2015046443A2015-03-12
JP2002045805A2002-02-12
JP2013153062A2013-08-08
Attorney, Agent or Firm:
AI ASSOCIATION OF PATENT AND TRADEMARK ATTORNEYS (JP)
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