Title:
SUBSTRATE FOR FILTER, AND FILTRATION MATERIAL FOR FILTER
Document Type and Number:
WIPO Patent Application WO/2022/158412
Kind Code:
A1
Abstract:
The present invention addresses the problem of obtaining: a substrate for a filter in which pressure loss does not readily increase when affixed through thermal fusion, and in which high peel strength is obtained between a porous film and the substrate for a filter; and a filtration material for a filter in which the substrate for a filter is used. The present invention is a substrate for a filter to be used as a filtration material for a filter in which a porous film is affixed by thermal fusion, wherein the substrate for a filter is a wet non-woven fabric including non-binder fibers (NB) and thermally fusible binder fibers (B). The present invention is also a filtration material for a filter in which the aforementioned substrate for a filter is used.
Inventors:
NAKAMURA TAKAYUKI (JP)
FUKUDA MOTOMICHI (JP)
TAKEUCHI TSUNEKATSU (JP)
SHIMIZU YUSUKE (JP)
FUKUDA MOTOMICHI (JP)
TAKEUCHI TSUNEKATSU (JP)
SHIMIZU YUSUKE (JP)
Application Number:
PCT/JP2022/001331
Publication Date:
July 28, 2022
Filing Date:
January 17, 2022
Export Citation:
Assignee:
MITSUBISHI PAPER MILLS LTD (JP)
International Classes:
B01D69/10; B01D69/12; B01D71/36; D04H1/541; D04H1/559; D21H13/24; D21H15/10; D21H27/00
Foreign References:
| JP2017144420A | 2017-08-24 | |||
| JP2020049482A | 2020-04-02 | |||
| JP2020058999A | 2020-04-16 | |||
| JP2017121606A | 2017-07-13 | |||
| JP2014151238A | 2014-08-25 | |||
| CN111663246A | 2020-09-15 |
Attorney, Agent or Firm:
ONO, Hisazumi et al. (JP)
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