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Title:
SUBSTRATE FINE PROCESSING METHOD, SUBSTRATE MANUFACTURING METHOD AND LIGHT EMITTING ELEMENT
Document Type and Number:
WIPO Patent Application WO/2007/114503
Kind Code:
A1
Abstract:
Provided are a substrate fine processing method, a substrate manufacturing method and a light emitting element. In the substrate fine processing method, after removing a single particle layer from a substrate having the single particle layer, a hole having an inner diameter smaller than the diameter of the particle is formed by etching by having at the center the position on the substrate where each particle constituting the single particle layer has been placed. The substrate manufacturing method includes the following steps (I-V) in this order; (I) a step of forming the single particle layer by arranging the particles on the substrate, (II) the diameter of the particle is reduced by etching the obtained substrate, (III) a step of forming a thin film composed of a mask material on the obtained substrate, (IV) a step of forming a mask provided with a hole whose inner diameter is equivalent to the diameter of the particle, at a position where each particle has existed, by removing the particle from the substrate, (V) a step of forming a hole having a diameter equivalent to the inner diameter of the hole of the mask on the substrate under the hole formed on the mask, by etching the substrate by using the mask. The light emitting element is composed of nitride semiconductor and has fine holes formed on the entire or a partial region of a light extracting surface and/or a facing surface.

Inventors:
ONO YOSHINOBU (JP)
KASAHARA KENJI (JP)
UEDA KAZUMASA (JP)
Application Number:
PCT/JP2007/057700
Publication Date:
October 11, 2007
Filing Date:
March 30, 2007
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO (JP)
ONO YOSHINOBU (JP)
KASAHARA KENJI (JP)
UEDA KAZUMASA (JP)
International Classes:
B82B3/00; H01L21/3065; H01L33/22
Foreign References:
JPS58120255A1983-07-18
JP2003218383A2003-07-31
JP2005244201A2005-09-08
Attorney, Agent or Firm:
ENOMOTO, Masayuki et al. (Limited5-33, Kitahama 4-chome, Chuo-k, Osaka-shi Osaka 50, JP)
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