Title:
SUBSTRATE HAVING ANTI-GLARE FILM, METHOD FOR MANUFACTURING SAME, AND PRODUCT
Document Type and Number:
WIPO Patent Application WO/2015/186669
Kind Code:
A1
Abstract:
Provided are a manufacturing method whereby a substrate having an anti-glare film having excellent anti-glare performance can be manufactured in a short time, a substrate having an anti-glare film having excellent anti-glare performance, and a product provided with the substrate. A method for manufacturing a substrate (1) having an anti-glare film, the substrate (1) having an anti-glare film provided with a substrate (3) and an anti-glare film (5) formed on the substrate (3), the method having a step for preparing a coating composition including a silica precursor (A) and/or particles (C) and a liquid medium (B), the liquid medium (B) including a liquid medium (B1) having a boiling point of 150°C or lower in an amount of at least 86% by mass with respect to the total quantity of the liquid medium (B), a step for applying the coating composition to the substrate (3) and forming a coating film by electrically charging and spraying the coating composition, and a step for forming the anti-glare film (5) by firing the coating film.
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Inventors:
TAKAI AZUSA (JP)
TANEDA SHUJI (JP)
MOTOTANI SATOSHI (JP)
OTANI YOSHIMI (JP)
TANEDA SHUJI (JP)
MOTOTANI SATOSHI (JP)
OTANI YOSHIMI (JP)
Application Number:
PCT/JP2015/065802
Publication Date:
December 10, 2015
Filing Date:
June 01, 2015
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
B05D5/06; B05B5/04; B05D1/04; B05D7/24; G02B5/02
Domestic Patent References:
| WO2013065801A1 | 2013-05-10 | |||
| WO2004085493A1 | 2004-10-07 |
Foreign References:
| JP2009058640A | 2009-03-19 |
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
Spring name Kenji (JP)
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