Title:
SUBSTRATE HOLDER SYSTEM WITH SUBSTRATE EXTENSION APPARATUS AND ASSOCIATED METHOD
Document Type and Number:
WIPO Patent Application WO2002064861
Kind Code:
A3
Abstract:
An apparatus and associated method that removes electrolyte solution from a substrate, the apparatus comprises a thrust plate and a substrate extension unit. The thrust plate at least partially defines a spin recess. The substrate extension unit can be displaced between a retracted position and an extended position relative to the spin recess. The substrate extension unit is disposed within the spin recess when positioned in the retracted position. The substrate extension unit at least partially extends from within the spin recess when positioned in the extended position. The substrate is processed by immersing at least a portion of the substrate in a wet solution. The substrate is removed from the wet solution. The substrate extension unit extends into its extended position, and the substrate is spun. Extending the substrate extension unit limits the formation of fluid traps within the substrate holder assembly or between the substrate and the substrate holder assembly.
Inventors:
OLGADO DONALD J K
LAKSHMIKANTHAN JAYANT
LAKSHMIKANTHAN JAYANT
Application Number:
PCT/US2002/001468
Publication Date:
November 27, 2003
Filing Date:
January 17, 2002
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
International Classes:
C25D7/12; (IPC1-7): H01L21/00; C25D7/12
Domestic Patent References:
| WO1999054920A2 | 1999-10-28 | |||
| WO2000003071A1 | 2000-01-20 |
Foreign References:
| US6080291A | 2000-06-27 | |||
| US6156167A | 2000-12-05 |
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