SUBSTRATE HOLDING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

WIPO Patent Application WO/2006/030908

A1

A substrate holding apparatus which can prevent a liquid from entering into a rear plane side of a substrate. The substrate holding apparatus (PH) is provided with a base material (PHB), a first holding part (PH1) formed on the base material (PHB) for holding the substrate (P), and a second holding part (PH2) formed on the base material (PHB) for holding a plate member (T) by surrounding the circumference of the processing substrate (P) held by the first holding part (PH1). The second holding part (PH2) holds the plate member (T) so as to form a second space (32) on the side of the rear plane (Tb) of the plate member (T). On the rear plane (Tb) of the plate member (T), an absorbing member (100) is arranged for absorbing the liquid (LQ) entered from a gap (A) between the substrate (P) held by the first holding part (PH1) and the plate member (T) held by the second holding part (PH2).

NAGASAKA HIROYUKI (JP)
SHIBUTA MAKOTO (JP)
NAKANO KATSUSHI (JP)
YOSHIDA YUICHI (JP)
TAKAIWA HIROAKI (JP)

PCT/JP2005/017173

March 23, 2006

September 16, 2005

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NIKON CORP (JP)
NAGASAKA HIROYUKI (JP)
SHIBUTA MAKOTO (JP)
NAKANO KATSUSHI (JP)
YOSHIDA YUICHI (JP)
TAKAIWA HIROAKI (JP)

H01L21/027; G03F7/20; H01L21/67

WO2005059977A1	2005-06-30
WO2004112108A1	2004-12-23
WO2005057636A1	2005-06-23

EP1429188A2	2004-06-16
JP2005191557A	2005-07-14
JP2005259870A	2005-09-22

See also references of EP 1801850A4
None

Shiga, Masatake (Yaesu Chuo-ku, Tokyo 53, JP)

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