Title:
SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND INSPECTING APPARATUS AND INSPECTING METHOD USING THE SUBSTRATE HOLDING APPARATUS AND THE SUBSTRATE HOLDING METHOD
Document Type and Number:
WIPO Patent Application WO/2011/121868
Kind Code:
A1
Abstract:
Conventional substrate holding apparatuses that hold substrates in non-contact manner without contaminating the substrates have been causing troubles in various processes due to the fact that the substrates are warped with the weight thereof and are warped due to wind pressure generated by rotational movement under use conditions.
Disclosed is a substrate mounting apparatus wherein a non-contact displacement sensor that measures the height of the substrate surface is disposed on the upper surface of the substrate so as to maintain the upper surface of the substrate at a desired surface height or maintain flatness, a plurality of grooves and barrier walls are provided on the upper surface of a placing table, air is supplied to between the substrate and the placing table, and displacement of the substrate is made possible with the pressure of the air. Furthermore, the substrate mounting apparatus has a structure that can have the substrate deformed into a discretionary protruding or recessed shape or flattened by feeding back the output of the displacement sensor.
Inventors:
MIYAZAKI, Yusuke (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
宮崎 祐輔 (〒04 茨城県ひたちなか市大字市毛８８２番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
AIKO, Kenji (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
愛甲 健二 (〒04 茨城県ひたちなか市大字市毛８８２番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
宮崎 祐輔 (〒04 茨城県ひたちなか市大字市毛８８２番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
AIKO, Kenji (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
愛甲 健二 (〒04 茨城県ひたちなか市大字市毛８８２番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
Application Number:
JP2011/000161
Publication Date:
October 06, 2011
Filing Date:
January 14, 2011
Export Citation:
Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社 日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
MIYAZAKI, Yusuke (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
宮崎 祐輔 (〒04 茨城県ひたちなか市大字市毛８８２番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
AIKO, Kenji (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
株式会社 日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
MIYAZAKI, Yusuke (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
宮崎 祐輔 (〒04 茨城県ひたちなか市大字市毛８８２番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
AIKO, Kenji (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
International Classes:
H01L21/683; G01B7/00; G01B11/30; G01N21/84
Attorney, Agent or Firm:
INOUE, Manabu et al. (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)
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