SUBSTRATE HOLDING DEVICE, FILM FORMING APPARATUS AND SUBSTRATE HOLDING METHOD

WIPO Patent Application WO/2016/199759

A1

Provided is a substrate holding device which is capable of ensuring adhesion between a mask and a substrate. This substrate holding device 30 is provided with: a mask plate 311; an intermediate plate 32; a holding plate 33; and a pressing mechanism 34. The mask plate 311 is configured from a magnetic material. The intermediate plate 32 comprises a first surface facing the mask plate 311 and a second surface that is on the reverse side of the first surface, and is configured such that the first surface is able to come into contact with a substrate W that is arranged on the mask plate 311. The holding plate 33 supports the intermediate plate 32 in such a manner that the intermediate plate 32 is relatively movable in an axial direction that is perpendicular to the mask plate 311, and comprises a magnet 331 which is configured so as to be capable of magnetically sucking the mask plate 311, with the intermediate plate 32 and the substrate W being interposed therebetween. The pressing mechanism 34 is arranged so as to face the second surface, and is configured so as to be capable of pressing at least a part of the second surface in the above-described axial direction.

JP2002005770	PRESSURE DETECTING DEVICE
JP6844804	Exposure device and exposure method
JP6291275	Pasting method

ORIBE AYUMI (JP)
HAGIWARA MUNEMOTO (JP)
UMEMURA HIROFUMI (JP)
KASUYA NORIAKI (JP)
KOIKE JUNICHIRO (JP)
KOIZUMI KAZUHIKO (JP)
FUJINO EIJI (JP)

PCT/JP2016/066899

December 15, 2016

June 07, 2016

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ULVAC INC (JP)

H01L21/683; C23C14/04

JP2009167471A	2009-07-30
JP2015088526A	2015-05-07
JP2007119895A	2007-05-17

OMORI, JUNICHI (JP)
Omori Junichi (JP)

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