Title:
SUBSTRATE FOR IMMERSION EXPOSURE, EXPOSURE METHOD AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/007723
Kind Code:
A1
Abstract:
A substrate (P) has a back surface (Pb) which is supported by a substrate holder,
and while being supported by the holder, a front surface (Pa) of the substrate
is irradiated with an exposure light. In the back surface (Pb) of the substrate
(P), a region (A3) facing the upper surface of a peripheral wall of the substrate
holder is formed flat. Consequently, the region (A3) can closely adhere to the
upper surface of the peripheral wall, thereby suppressing intrusion of water
to the back surface side of the substrate.
Inventors:
FUJIWARA TOMOHARU (JP)
Application Number:
PCT/JP2006/313701
Publication Date:
January 18, 2007
Filing Date:
July 10, 2006
Export Citation:
Assignee:
NIKON CORP (JP)
FUJIWARA TOMOHARU (JP)
FUJIWARA TOMOHARU (JP)
International Classes:
H01L21/027; G03F7/20; H01L21/02
Domestic Patent References:
| WO2005057636A1 | 2005-06-23 | |||
| WO2005059977A1 | 2005-06-30 |
Foreign References:
| JPH0757980A | 1995-03-03 | |||
| JPH06349795A | 1994-12-22 |
Attorney, Agent or Firm:
KAWAKITA, Kijuro (5-4 Shinjuku 1-chom, Shinjuku-ku Tokyo 22, JP)
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