SUBSTRATE INSPECTION DEVICE AND SUBSTRATE DISTORTION COMPENSATING METHOD USING SAME

Title:

SUBSTRATE INSPECTION DEVICE AND SUBSTRATE DISTORTION COMPENSATING METHOD USING SAME

Document Type and Number:

WIPO Patent Application WO/2018/066852

Kind Code:

A1

Abstract:

A substrate inspection device comprises a measurement unit, a processing unit, and a display unit, wherein: the measurement unit acquires measurement data on at least a part of a substrate; the processing unit compares the measurement data of the substrate with reference data of the substrate on the basis of a plurality of selection characteristic objects, compares the selection characteristic objects corresponding to each other so as to compensate for distortion of the substrate, and inspects the substrate for which distortion has been compensated; the display unit displays a first area, which is an area in which the distortion compensation was successful, and a second area, in which the distortion compensation has failed, so as to distinguish the first and second areas from each other; and the processing unit compares the number of recognizable valid characteristic objects with the reference number thereof and determines that the distortion compensation has failed if the number of recognizable valid characteristic objects is less than the reference number thereof. Therefore, user convenience can be improved and a user can easily recover from a failure of the distortion compensation, and distortion can be accurately and effectively compensated for.

Inventors:

JUNG SEUNG WON (KR)
CHOI JONG JIN (KR)

Application Number:

PCT/KR2017/010507

Publication Date:

April 12, 2018

Filing Date:

September 22, 2017

Export Citation:

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Assignee:

KOH YOUNG TECH INC (KR)

International Classes:

H05K13/08; G01B11/24

Foreign References:

KR101447570B1	2014-10-07
KR20120069646A	2012-06-28
KR20150053798A	2015-05-18
KR20150045413A	2015-04-28
US20080046210A1	2008-02-21
KR101132779B1	2012-04-09

Other References: