Title:
SUBSTRATE INSPECTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/056021
Kind Code:
A1
Abstract:
Provided is a substrate inspection device that can prevent condensation. A wafer inspection device 10 that comprises: a pogo frame 22 that holds a probe card 18; a chuck top 20 that faces the probe card 18 and carries a wafer W; and a dry gas chamber 38 that is provided separately from an inspection chamber 11 in which the pogo frame 22 and the chuck top 20 are arranged. The chuck top 20 is moved toward the pogo frame 22 such that the probe card 18 contacts the wafer W, a closed space S is formed between the pogo frame 22 and the chuck top 20, the pressure of the closed space S is reduced to maintain the state of contact between the probe card 18 and the wafer W, and a gas introduction pipe 29 introduces a dry gas that is in an inside space of the dry gas chamber 38 to the closed space S to separate the wafer W from the probe card 18.
Inventors:
YAMADA HIROSHI (JP)
FUJIHARA JUN (JP)
FUJIHARA JUN (JP)
Application Number:
PCT/JP2017/031504
Publication Date:
March 29, 2018
Filing Date:
August 25, 2017
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
G01R31/28; H01L21/66
Foreign References:
| JP2015035577A | 2015-02-19 | |||
| JP2000147053A | 2000-05-26 | |||
| JP2009105339A | 2009-05-14 |
Attorney, Agent or Firm:
BECCHAKU Shigehisa et al. (JP)
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