Title:
SUBSTRATE FOR MASK BLANK, MASK BLANK, METHODS FOR MANUFACTURING SUBSTRATE FOR MASK BLANK AND MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/098452
Kind Code:
A8
Abstract:
The purpose of the present invention is to provide a substrate for a mask blank, a mask blank, and a transfer mask, facilitating the correction of a wavefront using a wavefront correction function in an exposure device. The purpose of the present invention also includes providing methods for manufacturing these products. A virtual plane profile is assumed to optically form in effect, a flat reference plane profile defined by the Zernike polynomials constituted by only terms with 2nd order or less of the variables in relation to a radius and including one or more terms with 2nd order of the variables in relation to a radius. A substrate for a mask blank is selected to have data (a PV value) of 25 nm or less, which is representing a difference between the maximum value and the minimum value of the difference waveform between a composite plane profile acquired by synthesizing each plane profile of two principal surfaces and the virtual plane profile.
Inventors:
IKEBE YOHEI (JP)
TANABE MASARU (JP)
TANABE MASARU (JP)
Application Number:
PCT/JP2015/080088
Publication Date:
April 20, 2017
Filing Date:
October 26, 2015
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
G03F1/60; C03C17/36; G03F1/24; G03F7/20
Attorney, Agent or Firm:
NAGATA, Yutaka et al. (JP)
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