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Title:
SUBSTRATE FOR PATTERN FORMATION
Document Type and Number:
WIPO Patent Application WO/2019/026803
Kind Code:
A1
Abstract:
A substrate for pattern formation has at least a base material and a portion derived from a perfluoro(poly)ether-group-containing silane compound, the base material having at least one main surface that has a first region and a second region, which is a pattern formation region adjacent to the first region, and the portion derived from a perfluoro(poly)ether-group-containing silane compound being disposed in the first region.

Inventors:
HONDA, Yoshiaki (Umeda Center Building, 4-12, Nakazaki-Nishi 2-Chome, Kita-ku, Osaka-sh, Osaka 23, 〒5308323, JP)
Application Number:
JP2018/028306
Publication Date:
February 07, 2019
Filing Date:
July 27, 2018
Export Citation:
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Assignee:
DAIKIN INDUSTRIES, LTD. (Umeda Center Building, 4-12 Nakazaki-Nishi 2-Chome, Kita-ku, Osaka-sh, Osaka 23, 〒5308323, JP)
International Classes:
B32B27/00; B05D1/32; B05D7/24; H05K1/02; H05K3/12
Domestic Patent References:
WO2004027889A12004-04-01
Foreign References:
JP2004146478A2004-05-20
JP2017133003A2017-08-03
JP2016132719A2016-07-25
Attorney, Agent or Firm:
YAMAO, Norihito et al. (AOYAMA & PARTNERS, Umeda Hankyu Bldg. Office Tower 8-1, Kakuda-cho, Kita-ku, Osaka-sh, Osaka 17, 〒5300017, JP)
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