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Title:
SUBSTRATE FOR PATTERNING THIN FILM AND SURFACE TREATMENT THEREOF
Document Type and Number:
WIPO Patent Application WO/1999/048339
Kind Code:
A1
Abstract:
A display, such as an EL device having little variation in film thickness between pixels, and a color filter are disclosed. Arranged on a substrate are pixels formed by an ink-jet method in regions to be coated and partitioned by banks so formed as to satisfy the formulae a$m(g)d/4, d/2$m(f)b$m(f)5d, c$m(g)t¿0?, c$m(g)(1/2)x(d/b) where a is the width of the banks, c is the height of the banks, b is the width of the regions to be coated, d is the diameter of droplets of a liquid material for forming a thin film, and t¿0? is the thickness of the thin film. A method of modifying the surface is a method comprising forming banks of an organic martial on an inorganic bank forming surface, and performing a plasma processing under an excessive fluorine condition, or a method comprising performing oxygen gas plasma processing of a substrate having banks formed of an organic material, and then performing fluorine-based gas plasma processing.

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Inventors:
SEKI SYUNICHI (JP)
KIGUCHI HIROSHI (JP)
YUDASAKA ICHIO (JP)
MIYAJIMA HIROO (JP)
Application Number:
PCT/JP1999/001327
Publication Date:
September 23, 1999
Filing Date:
March 17, 1999
Export Citation:
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Assignee:
SEIKO EPSON CORP (JP)
SEKI SYUNICHI (JP)
KIGUCHI HIROSHI (JP)
YUDASAKA ICHIO (JP)
MIYAJIMA HIROO (JP)
International Classes:
G02B5/20; G09F9/00; G09F9/30; G09F9/33; H01L27/32; H01L33/26; H01L33/42; H01L33/48; H01L51/00; H01L51/40; H01L51/50; H01L51/56; H05B33/10; H05B33/12; H05B33/14; H05B33/22; H01L51/52; (IPC1-7): H05B33/22; H05B33/10; G02B5/20; G09F9/00; G09F9/30; H01L29/78; H01L27/15; H01L51/00
Foreign References:
JPH06347637A1994-12-22
JPH09258208A1997-10-03
JPH10153967A1998-06-09
JPH06109912A1994-04-22
JPH09230129A1997-09-05
JP2700316B21998-01-21
JPH07234314A1995-09-05
JPH1140354A1999-02-12
Other References:
See also references of EP 0989778A4
Attorney, Agent or Firm:
Inaba, Yoshiyuki (Suite 803 5-1 Toranomon 3-chome Minato-ku, Tokyo, JP)
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