SUBSTRATE POLISHING APPARATUS - BOE TECHNOLOGY GROUP CO LTD

Title:

SUBSTRATE POLISHING APPARATUS

Document Type and Number:

WIPO Patent Application WO/2017/133124

Kind Code:

A1

Abstract:

A substrate polishing apparatus, comprising an object platform (10), a lifting platform (20), and a polishing head (30). The lifting platform (20) is located above the object platform (10) and can move upward or downward with respect to the object platform (10) along a direction perpendicular to an upper surface of the object platform (10); the polishing head (30) is mounted on the lifting platform (20) and can polish a polishing area of a to-be-polished substrate placed on the object platform (10); the polishing area is a partially scratched area of the to-be-polished substrate.

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Inventors:

HU WEIQIN (CN)
CHEN CHANGXU (CN)

Application Number:

PCT/CN2016/082023

Publication Date:

August 10, 2017

Filing Date:

May 13, 2016

Export Citation:

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Assignee:

BOE TECHNOLOGY GROUP CO LTD (CN)
BEIJING BOE DISPLAY TECH CO (CN)

International Classes:

B24B37/10

Foreign References:

CN104647193A	2015-05-27
CN103128628A	2013-06-05
CN105033839A	2015-11-11
US20030100196A1	2003-05-29

Attorney, Agent or Firm:

CHINA SCIENCE PATENT & TRADEMARK AGENT LTD. (CN)

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