Title:
SUBSTRATE PROCESSING APPARATUS HAVING EXHAUST GAS DECOMPOSER, AND EXHAUST GAS PROCESSING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2017/061742
Kind Code:
A1
Abstract:
A substrate processing apparatus and an exhaust gas processing method therefor are disclosed. The substrate processing apparatus and the exhaust gas processing method therefor, according to the present invention, allow a source gas exhausted from a processing chamber to be decomposed in an exhaust gas decomposer to decompose a ligand of the source gas. Further, the ligand and the source gas with the decomposed ligand are stabilized by reaction with separately supplied O2, N2O or O3, and are then introduced into and discharged from an exhaust pump in the form of a mixture gas mixed with a reaction gas, or are discharged from the exhaust pump while being mixed with the reaction gas whereby the ligand and the source gas with the decomposed ligand do not react with heat generated from the exhaust pump and also do not react with the reaction gas. Thus, it is possible to prevent the ligand and the source gas with the decomposed ligand introduced into the exhaust pump from being deposited on the inner surface of the exhaust pump. It is also possible to prevent explosion of the ligand and the source gas with the decomposed ligand accumulated inside the exhaust pump.
Inventors:
SEO DONG WON (KR)
KIM HEON DO (KR)
HWANG CHUL-JOO (KR)
KIM HEON DO (KR)
HWANG CHUL-JOO (KR)
Application Number:
PCT/KR2016/011045
Publication Date:
April 13, 2017
Filing Date:
October 04, 2016
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01L21/02; H01L21/60; H01L21/67
Foreign References:
| KR20100077444A | 2010-07-08 | |||
| US20100043888A1 | 2010-02-25 | |||
| US20150176124A1 | 2015-06-25 | |||
| KR20150096622A | 2015-08-25 | |||
| US20060107973A1 | 2006-05-25 |
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (KR)
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