Title:
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/134853
Kind Code:
A1
Abstract:
The present invention has: a processing chamber in which a substrate held by a substrate holder is processed; and a preparation chamber in the interior of which a carrying mechanism for carrying the substrate holder into the processing chamber and a transfer mechanism for transferring the substrate holder to the carrying mechanism are disposed and that is configured to be capable of communicating with the processing chamber, wherein the transfer mechanism is configured to transfer one or multiple substrate holders holding substrates between a detachment position outside the preparation chamber at which the substrate holders are detached and a handover position inside the preparation chamber at which the substrate holders are transferred to the carrying mechanism.
Inventors:
MIYOSHI HIDEYUKI (JP)
FUJII SATOSHI (JP)
FUJII SATOSHI (JP)
Application Number:
PCT/JP2016/077843
Publication Date:
August 10, 2017
Filing Date:
September 21, 2016
Export Citation:
Assignee:
KOKUSAI ELECTRIC SEMICONDUCTOR SERVICE INC (JP)
HITACHI INT ELECTRIC INC (JP)
HITACHI INT ELECTRIC INC (JP)
International Classes:
C23C16/44; H01L21/31; H01L21/02; H01L21/22; H01L21/677
Foreign References:
| JP2001267247A | 2001-09-28 | |||
| JPH07130727A | 1995-05-19 | |||
| JP2005203458A | 2005-07-28 | |||
| JP2011108958A | 2011-06-02 | |||
| JPH0817752A | 1996-01-19 | |||
| JP2000007382A | 2000-01-11 | |||
| JP2012044060A | 2012-03-01 | |||
| JP2001237193A | 2001-08-31 |
Attorney, Agent or Firm:
FUKUOKA Masahiro et al. (JP)
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