Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2017/217816
Kind Code:
A1
Abstract:
The present invention relates to a substrate processing apparatus for performing substrate processing while a carrier (100) on which a substrate (S) is placed is transferred vertically in a process chamber (10), and provided is a substrate processing apparatus comprising: a linear movement guide unit (300), installed in the process chamber (10), for supporting a lower portion of the carrier (100) so as to be linearly movable; and a magnetic force generating unit (200), installed in the process chamber (10), for maintaining a vertical state and a linearly movable state of the carrier (100) in the process chamber by a magnetic force in a non-contact state with a magnetic force reaction member (110) installed at an upper portion of the carrier (100), so that a contact area generated during a transfer of the carrier (100) on which the substrate (S) is placed is efficiently minimized, while the carrier (100) can be stably maintained in a vertical state.
Inventors:
JEONG JAE WOOK (KR)
Application Number:
PCT/KR2017/006340
Publication Date:
December 21, 2017
Filing Date:
June 16, 2017
Export Citation:
Assignee:
VNI SOLUTION CO LTD (KR)
International Classes:
H01L21/677
Foreign References:
| KR20060011586A | 2006-02-03 | |||
| KR20080046761A | 2008-05-28 | |||
| KR20050094700A | 2005-09-28 | |||
| KR20150078173A | 2015-07-08 | |||
| KR100707390B1 | 2007-04-13 |
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