Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/006676
Kind Code:
A1
Abstract:
The present application relates to a substrate processing apparatus comprising: a processing chamber providing a reaction space for processing a substrate; a substrate support part for supporting the substrate; a first electrode provided inside the processing chamber facing the substrate, and comprising a plurality of protruding electrodes protruding toward the substrate; and a second electrode positioned under the first electrode and having a plurality of insertion holes into which the protruding electrodes are inserted, wherein the insertion holes of the second electrode comprise first holes of the upper side into which the protruding electrodes are inserted, and second holes of the lower side facing the upper side, the first holes having a first opening and the second holes having a second opening, and the area of the first opening at the center of the second electrode is different from that at the edge of same.
Inventors:
OH WOONG KYO (KR)
KIM YOUNG WOON (KR)
YOO KWANG SU (KR)
KIM DO HYUNG (KR)
HA YUN GYU (KR)
KIM YOUNG WOON (KR)
YOO KWANG SU (KR)
KIM DO HYUNG (KR)
HA YUN GYU (KR)
Application Number:
PCT/KR2020/009047
Publication Date:
January 14, 2021
Filing Date:
July 09, 2020
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01J37/32; H01L21/67
Foreign References:
| KR101160906B1 | 2012-06-28 | |||
| KR20110074854A | 2011-07-04 | |||
| KR101585891B1 | 2016-01-15 | |||
| KR101119797B1 | 2012-03-22 | |||
| JP5895603B2 | 2016-03-30 |
Attorney, Agent or Firm:
KO, Yun Ho (KR)
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