Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING DEVICE CONTROL METHOD
Document Type and Number:
WIPO Patent Application WO/2016/136367
Kind Code:
A1
Abstract:
In this invention, in a coating device (1), a nozzle transfer mechanism (5) grips selectively any of a plurality of coating solution nozzles (3), moves the gripped coating solution nozzle (3) and a solvent nozzle (4) in a unified manner and moves at least the solvent nozzle (4) to a solvent aspiration unit (35). Then, a solvent is discharged from the solvent nozzle (4), which has moved, into the solvent aspiration unit (35), and the gripped coating solution nozzle (3) is caused to aspirate the solvent accumulated in the same solvent aspiration unit (35) as that in which the solvent has been discharged. Therefore, due to the performance of discharge and aspiration of solvent by the same solvent aspiration unit (35), the amount of solvent used can be restricted. In addition, the solvent aspiration unit (35) may not need to be provided with a supply system for supplying the solvent. Therefore, the structure of the solvent aspiration unit (35) can be simplified, allowing the costs to be restricted.
Inventors:
TAKAHASHI YASUO (JP)
Application Number:
PCT/JP2016/052390
Publication Date:
September 01, 2016
Filing Date:
January 27, 2016
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/027; B05C11/08; B05C11/10; B05C5/00
Foreign References:
| JP2010253403A | 2010-11-11 | |||
| JP2006302934A | 2006-11-02 | |||
| JPH04200768A | 1992-07-21 | |||
| JP2015006652A | 2015-01-15 | |||
| JP2003178965A | 2003-06-27 |
Attorney, Agent or Firm:
SUGITANI Tsutomu (JP)
Tsutomu Sugitani (JP)
Tsutomu Sugitani (JP)
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