SUBSTRATE PROCESSING DEVICE, DEVICE MANUFACTURING SYSTEM AND DEVICE MANUFACTURING METHOD

WIPO Patent Application WO/2013/094286

A1

A substrate processing device (1011) is provided with: a first support component (1021) that supports one member object of a set consisting of a first object (M) and a second object (P), said member object being supported such that, in one member area of a set consisting of an illumination area (IR) and a projection area (PA), said member object aligns with a first surface (p1001) that curves with a specified curvature and in the form of a cylindrical surface; and a second support component (1022) that supports the other member object of the set consisting of the first object and the second object, said member object being supported such that, in the other member area of the set consisting of the illumination area and the projection area, said member object aligns with a specified second surface (p1002). A projection optical system (PL) is provided with a deflecting component for propagating an image-forming light beam such that within a principal ray of the image-forming light beam, which extends from the illumination area to the projection area, the principal ray between the first surface and the projection optical system is oriented in a radial direction not perpendicular to the second surface, said direction being a first-surface radial direction.

KATO MASAKI (JP)

PCT/JP2012/076326

June 27, 2013

October 11, 2012

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NIKON CORP (JP)

G03F7/20; G02B13/24; G02B17/08; G03F1/00; H01L21/027

WO2008029917A1

2008-03-13

JP2011221538A	2011-11-04
JPH11219892A	1999-08-10
JP2011203311A	2011-10-13
JP2006098719A	2006-04-13
JP2007316589A	2007-12-06
JP2007121998A	2007-05-17
JP2004062205A	2004-02-26
JPH0864497A	1996-03-08

SHIGA Masatake et al. (JP)
Masatake Shiga (JP)

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