SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD, FAST ROTARY VALVES, CLEANING METHOD

Title:

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD, FAST ROTARY VALVES, CLEANING METHOD

Document Type and Number:

WIPO Patent Application WO/2003/081659

Kind Code:

A1

Abstract:

A substrate processing device capable of setting the conductance of an exhaust port when a reaction container is evacuated to a small value so as to form laminar flow in the reaction container during an ALD process, and to a large value so as to purge the inside of the reaction container in a short time during a purge process. Exhaust ports (201a, 201b) in a substrate processing device (40) each have a slit shape extending in a direction almost orthogonal to a laminar flow direction. Rotary valves (25A, 25B) provided with valve discs having respectively slit-like openings corresponding to the above slit shapes engage the above exhaust ports. A conductance changes with the rotation of a valve disc in a rotary valve.

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Inventors:

SHINRIKI HIROSHI (JP)
ARAMI JUNICHI (JP)

Application Number:

PCT/JP2003/003655

Publication Date:

October 02, 2003

Filing Date:

March 25, 2003

Export Citation:

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Assignee:

TOKYO ELECTRON LTD (JP)
SHINRIKI HIROSHI (JP)
ARAMI JUNICHI (JP)

International Classes:

B08B7/00; C23C16/44; C23C16/455; F16K5/04; F16K51/02; (IPC1-7): H01L21/31; F16K5/04; F16K51/02

Domestic Patent References:

WO2002015243A1	2002-02-21
WO2002009166A1	2002-01-31
WO1999020925A1	1999-04-29

Foreign References:

JP2000068209A	2000-03-03
JPH048872U	1992-01-27
US6206029B1	2001-03-27

Other References: