SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, PROGRAM, AND ARTICLE MANUFACTURING METHOD

Title:

SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, PROGRAM, AND ARTICLE MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/2017/208982

Kind Code:

A1

Abstract:

A substrate processing device has: a first processing unit for performing a first process on a first substrate; a second processing unit for performing a second process on the first substrate on which the first process was performed; a determination unit for determining the timing for inputting a second substrate into the first processing unit, on the basis of the time required for the second process; and a change unit for giving a third substrate priority over the second substrate when a new processing request is received for processing the third substrate while waiting for input of the second substrate by the determined timing, and changing the processing order so as to input the third substrate into the first processing unit.

Inventors:

TAKARADA YOSUKE (JP)
TADA YOSHIHITO (JP)

Application Number:

PCT/JP2017/019639

Publication Date:

December 07, 2017

Filing Date:

May 26, 2017

Export Citation:

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Assignee:

CANON KK (JP)

International Classes:

G03F7/20; H01L21/027; H01L21/677

Foreign References:

JP2004335750A	2004-11-25
JP2001028327A	2001-01-30
JP2015204401A	2015-11-16
JP2011018737A	2011-01-27
JPH09312323A	1997-12-02