SUBSTRATE-PROCESSING DEVICE AND SUBSTRATE-PROCESSING METHOD USING SAME

WIPO Patent Application WO/2018/066904

A1

The present invention provides a substrate-processing device comprising: a process chamber (10) for providing a process environment isolated from the outside; at least one distance measurement part for measuring a distance between a substrate (S) and a mask (350), installed in the process chamber (10), in a contactless manner; and a close-contact driving part for making the substrate (S) and the mask (350) be in close contact with each other through a relative movement between the substrate (S) and the mask (350) while the distance measurement part measures a distance between the substrate (S) and the mask (350). Therefore, the present invention can significantly improve a control and reliability with respect to alignment and close-contact operation of the substrate (S) and the mask (M), thereby greatly improving the yield of substrate processing.

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WO/2022/116730	PIXEL STRUCTURE, FINE METAL MASK PLATE, DISPLAY DEVICE, AND CONTROL METHOD

CHO SAENG HYUN (KR)
AHN SUNG IL (KR)

PCT/KR2017/010877

April 12, 2018

September 28, 2017

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VNI SOLUTION CO LTD (KR)

H01L51/56; C23C14/04; C23C14/54; H01L21/02; H01L21/203; H01L51/00

KR20070060319A	2007-06-13
KR20140017088A	2014-02-11
KR20140017094A	2014-02-11
JP2001077109A	2001-03-23
JP2001223169A	2001-08-17

NAM & NAM WORLD PATENT & LAW FIRM (KR)

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