Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/014881
Kind Code:
A1
Abstract:
Disclosed is a substrate processing device that, without being equipped with a cleaning chamber for cleaning, can efficiently and evenly clean a substrate surface in a short amount of time, and can increase substrate processing throughput. The substrate processing device is provided with: a receiving chamber for receiving a substrate; a film formation chamber that executes film-formation processing on the substrate; and a conveyance chamber having a substrate conveyance mechanism that conveys the substrate between the aforementioned receiving chamber and the aforementioned film formation chamber. The aforementioned receiving chamber and the aforementioned conveyance chamber are connected in an adjacent state, and the outside of either the aforementioned receiving chamber or the aforementioned conveyance chamber is provided with: a light radiating mechanism that radiates light on the conveyance pathway of the substrate; and a control unit that controls the amount and intensity of light radiated from the aforementioned light radiating mechanism. A transmission window that allows the passage of the light radiated from the aforementioned light radiating mechanism is provided to the one of the aforementioned receiving chamber or the aforementioned conveyance chamber to which the aforementioned light radiating mechanism is provided. The light radiated from the aforementioned light radiating mechanism to the substrate is radiated while moving the light relatively with respect to the substrate.
Inventors:
OSHIMA, Kiyomi (INC. 2-1, Osawa 3-chome, Izumi-ku, Sendai-sh, Miyagi 37, 〒9813137, JP)
大島 澄美 (〒37 宮城県仙台市泉区大沢３－２－１ 東京エレクトロン技術研究所株式会社内 Miyagi, 〒9813137, JP)
HAYASHI, Teruyuki (650 Mitsuzawa, Hosaka-cho, Nirasaki-sh, Yamanashi 92, 〒4070192, JP)
林 輝幸 (〒92 山梨県韮崎市穂坂町三ツ沢６５０ 東京エレクトロン株式会社内 Yamanashi, 〒4070192, JP)
大島 澄美 (〒37 宮城県仙台市泉区大沢３－２－１ 東京エレクトロン技術研究所株式会社内 Miyagi, 〒9813137, JP)
HAYASHI, Teruyuki (650 Mitsuzawa, Hosaka-cho, Nirasaki-sh, Yamanashi 92, 〒4070192, JP)
林 輝幸 (〒92 山梨県韮崎市穂坂町三ツ沢６５０ 東京エレクトロン株式会社内 Yamanashi, 〒4070192, JP)
Application Number:
JP2011/066944
Publication Date:
February 02, 2012
Filing Date:
July 26, 2011
Export Citation:
Assignee:
TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku Tokyo, 25, 〒1076325, JP)
東京エレクトロン株式会社 (〒25 東京都港区赤坂五丁目３番１号 Tokyo, 〒1076325, JP)
OSHIMA, Kiyomi (INC. 2-1, Osawa 3-chome, Izumi-ku, Sendai-sh, Miyagi 37, 〒9813137, JP)
大島 澄美 (〒37 宮城県仙台市泉区大沢３－２－１ 東京エレクトロン技術研究所株式会社内 Miyagi, 〒9813137, JP)
HAYASHI, Teruyuki (650 Mitsuzawa, Hosaka-cho, Nirasaki-sh, Yamanashi 92, 〒4070192, JP)
東京エレクトロン株式会社 (〒25 東京都港区赤坂五丁目３番１号 Tokyo, 〒1076325, JP)
OSHIMA, Kiyomi (INC. 2-1, Osawa 3-chome, Izumi-ku, Sendai-sh, Miyagi 37, 〒9813137, JP)
大島 澄美 (〒37 宮城県仙台市泉区大沢３－２－１ 東京エレクトロン技術研究所株式会社内 Miyagi, 〒9813137, JP)
HAYASHI, Teruyuki (650 Mitsuzawa, Hosaka-cho, Nirasaki-sh, Yamanashi 92, 〒4070192, JP)
International Classes:
H05B33/10; H01L21/304; H01L51/50
Attorney, Agent or Firm:
HAGIWARA, Yasushi et al. (Hazuki International, Kakubari Building 1-20, Sumiyoshi-cho, Shinjuku-k, Tokyo 65, 〒1620065, JP)
Claims:
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