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Patent Searching and Data


Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/131428
Kind Code:
A1
Abstract:
A substrate processing device comprising: a substrate holding unit for holding a substrate in a horizontal position; a processing liquid nozzle which includes a lower opening opposing an upper surface of the substrate being held by the substrate holding unit, and an inner wall defining a tubular space which extends in an up-down direction and which is upwardly continuous with the lower opening, the processing liquid nozzle ejecting processing liquid via the lower opening; a liquid column forming unit for forming, on the upper surface of the substrate, a liquid column of the processing liquid, the liquid column including a first liquid column portion filling an interval between the lower opening and the upper surface of the substrate with the processing liquid in a liquid-tight manner, and a second liquid column portion upwardly continuous with the first liquid column portion and consisting of the processing liquid stored in the tubular space; and a physical force providing unit for providing the second liquid column portion with physical force.

Inventors:
NISHIMURA YUTA (JP)
KOBAYASHI KENJI (JP)
NEGORO SEI (JP)
Application Number:
JP2017/046095
Publication Date:
July 19, 2018
Filing Date:
December 22, 2017
Export Citation:
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Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304; B08B3/02
Foreign References:
JP2011018900A2011-01-27
JP2001162239A2001-06-19
JP2016136599A2016-07-28
Attorney, Agent or Firm:
AI ASSOCIATION OF PATENT AND TRADEMARK ATTORNEYS (JP)
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