Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2020/059478
Kind Code:
A1
Abstract:
The purpose of the present invention is to improve the precision of processing at each processing unit of a substrate processing device and substrate processing system. A substrate processing device that comprises a plurality of processing units, a transport unit, a plurality of sensor parts, a storage part, and one or more control units. The plurality of processing units process substrates in accordance with a recipe that stipulates processing conditions. The transport unit successively transports a plurality of substrates of a group of substrates to the plurality of processing units. The plurality of sensor parts acquire signals related to one or more types of indicators for the circumstances of the substrate processing at the processing units. On the basis of the signals acquired by the plurality of sensor parts, the storage part stores a data group related to the one or more types of indicators for the circumstances of the substrate processing at the processing units. On the basis of the data group, the one or more control units correct at least a portion of the recipe with respect to the processing of at least one or more of the substrates from the group of substrates by one or more of the processing units.
Inventors:
HASHIMOTO KOJI (JP)
SHIMIZU SHINJI (JP)
HORIGUCHI HIROSHI (JP)
YAMAMOTO MASAHIRO (JP)
SHIMIZU SHINJI (JP)
HORIGUCHI HIROSHI (JP)
YAMAMOTO MASAHIRO (JP)
Application Number:
PCT/JP2019/034540
Publication Date:
March 26, 2020
Filing Date:
September 03, 2019
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/02; H01L21/304; H01L21/306
Domestic Patent References:
| WO2015107955A1 | 2015-07-23 |
Foreign References:
| JP2007123734A | 2007-05-17 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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