Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/011535
Kind Code:
A1
Abstract:
Disclosed is a substrate processing device that can directly detect the concentration of a processing liquid, and thus is able to perform independent concentration control mostly without being affected by the temperature of the processing liquid, and is able to accurately perform chemical processing of a substrate. The substrate processing device, which processes by immersing the substrate in the processing liquid comprising a mixture of a chemical and a diluting liquid, is provided with: a processing tank (1) that retains the processing liquid; heating means (2, 3) that heat the processing liquid; a temperature detection means (4) that detects the temperature of the processing liquid; a temperature control means (5) that operates the aforementioned heating means (2, 3) in a manner so that the detected temperature approaches a set temperature; a replenishing means (6) that replenishes the diluting liquid in the processing liquid; a concentration detection means (7) that detects the concentration of the processing liquid by measuring the light absorption characteristics of the processing liquid; and a concentration control means (8) that operates the aforementioned replenishing means (6) in a manner so that the detected concentration approaches a set concentration.
Inventors:
KIYOSE,Hiromi (TECHNICAL RESEARCH LABORATORY 14-5, Shimokida-cho, Neyagawa-sh, Osaka 23, 〒5720823, JP)
清瀬 浩巳 (〒23 大阪府寝屋川市下木田町１４番５号 倉敷紡績株式会社技術研究所内 Osaka, 〒5720823, JP)
HIRAKI,Satoru (TECHNICAL RESEARCH LABORATORY 14-5, Shimokida-cho, Neyagawa-sh, Osaka 23, 〒5720823, JP)
清瀬 浩巳 (〒23 大阪府寝屋川市下木田町１４番５号 倉敷紡績株式会社技術研究所内 Osaka, 〒5720823, JP)
HIRAKI,Satoru (TECHNICAL RESEARCH LABORATORY 14-5, Shimokida-cho, Neyagawa-sh, Osaka 23, 〒5720823, JP)
Application Number:
JP2011/066599
Publication Date:
January 26, 2012
Filing Date:
July 21, 2011
Export Citation:
Assignee:
Kurashiki Boseki Kabushiki Kaisha (7-1 Hommachi, Kurashiki-shi Okayama, 54, 〒7100054, JP)
倉敷紡績株式会社 (〒54 岡山県倉敷市本町７番１号 Okayama, 〒7100054, JP)
CHEMICAL ART TECHNOLOGY, INC. (3-15-33, Tsumada Kita Atsugi-sh, Kanagawa 12, 〒2430812, JP)
株式会社ケミカルアートテクノロジー (〒12 神奈川県厚木市妻田北３丁目１５番３３号 Kanagawa, 〒2430812, JP)
KIYOSE,Hiromi (TECHNICAL RESEARCH LABORATORY 14-5, Shimokida-cho, Neyagawa-sh, Osaka 23, 〒5720823, JP)
倉敷紡績株式会社 (〒54 岡山県倉敷市本町７番１号 Okayama, 〒7100054, JP)
CHEMICAL ART TECHNOLOGY, INC. (3-15-33, Tsumada Kita Atsugi-sh, Kanagawa 12, 〒2430812, JP)
株式会社ケミカルアートテクノロジー (〒12 神奈川県厚木市妻田北３丁目１５番３３号 Kanagawa, 〒2430812, JP)
KIYOSE,Hiromi (TECHNICAL RESEARCH LABORATORY 14-5, Shimokida-cho, Neyagawa-sh, Osaka 23, 〒5720823, JP)
International Classes:
H01L21/306; H01L21/308
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (SHIN-OSAKA MT Bldg. 1, 13-9 Nishinakajima 5-chome, Yodogawa-ku, Osaka-sh, Osaka 11, 〒5320011, JP)
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Claims: