Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/061353
Kind Code:
A1
Abstract:
This substrate processing device has a substrate holding means (13) for holding a substrate (W) in a horizontal orientation, processing liquid supplying means (30, 35) for supplying processing liquid to the outer surface of the substrate (W) held by the substrate holding means, a substrate rotating means (14) for rotating the substrate (W) held by the substrate holding means, and a heater (3) facing the substrate (W) held by the substrate holding means. This substrate processing device includes a heater supporting member (25) for supporting the heater independently of the substrate holding means, and a moving means (23) for moving the substrate holding means and/or the heater supporting member so that the heater and the substrate held by the substrate holding means are moved closer to or further away from each other.

Inventors:
HASHIZUME AKIO (JP)
OTA TAKASHI (JP)
Application Number:
PCT/JP2013/073195
Publication Date:
April 24, 2014
Filing Date:
August 29, 2013
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DAINIPPON SCREEN MFG (JP)
International Classes:
H01L21/304
Foreign References:
JP2012156264A2012-08-16
JP2005217226A2005-08-11
JP2007173432A2007-07-05
JP2005277268A2005-10-06
Attorney, Agent or Firm:
INAOKA, Kosaku et al. (JP)
Kosaku Inaoka (JP)
Download PDF: