Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/069079
Kind Code:
A1
Abstract:
A substrate processing device comprises: a storage tank for storing a phosphoric acid aqueous solution; a substrate support means for supporting a substrate immersed in the phosphoric acid aqueous solution horizontally in the storage tank; and a heating means, having a heater arranged opposite the substrate which is supported by the substrate support means, for heating the substrate with radiant heat or transmitted heat from the heater.
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Inventors:
OTA TAKASHI (JP)
HASHIZUME AKIO (JP)
HINODE TAIKI (JP)
HASHIZUME AKIO (JP)
HINODE TAIKI (JP)
Application Number:
PCT/JP2013/072438
Publication Date:
May 08, 2014
Filing Date:
August 22, 2013
Export Citation:
Assignee:
DAINIPPON SCREEN MFG (JP)
International Classes:
H01L21/306; H01L21/304
Foreign References:
| JP2000031113A | 2000-01-28 | |||
| JP2005079212A | 2005-03-24 | |||
| JP2008235333A | 2008-10-02 | |||
| JP2008066400A | 2008-03-21 | |||
| JPH07161674A | 1995-06-23 | |||
| JPH08236497A | 1996-09-13 | |||
| JPH09162153A | 1997-06-20 |
Attorney, Agent or Firm:
INAOKA, Kosaku et al. (JP)
Kosaku Inaoka (JP)
Kosaku Inaoka (JP)
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