Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/051825
Kind Code:
A1
Abstract:
The objective of the present invention is to sufficiently exhaust the atmosphere in a chamber even when the exhaust amount of external exhaust equipment is insufficient. In order to achieve the objective, a substrate processing device is provided with: a chamber; a substrate processing mechanism that has a holding member capable of holding a substrate in a substantially horizontal state and is housed in the chamber, and discharges processing fluid onto the substrate held by the holding member in order to process the substrate; a joint pipe that has a lower opening provided below the holding member and facing the inside of the chamber and an upper opening provided above the holding member and facing the inside of the chamber, and is disposed such that at least a part thereof from the lower opening to the upper opening passes through the outside of the chamber; and an air flow generator that is provided on the joint pipe, wherein the air flow generator circulates the atmosphere in the chamber by discharging the atmosphere, which contains a specific gas, in the chamber from the lower opening to the joint pipe to allow the atmosphere to pass through the joint pipe, thereby introducing the atmosphere again into the chamber via the upper opening so that the downflow of the atmosphere occurs in the chamber.
Inventors:
OKITA NOBUAKI (JP)
NISHIMURA JOICHI (JP)
NISHIMURA JOICHI (JP)
Application Number:
PCT/JP2017/031750
Publication Date:
March 22, 2018
Filing Date:
September 04, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304
Foreign References:
| JP2012004245A | 2012-01-05 | |||
| JPH1174168A | 1999-03-16 | |||
| JPH09145112A | 1997-06-06 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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