Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/008784
Kind Code:
A1
Abstract:
A substrate processing device (1), comprising a substrate holding part (2), a substrate rotation mechanism (3), and a barrier plate (51). The barrier plate (51) is disposed at a processing position, which is near the upper surface (91) of a substrate (9) when the substrate (9) is being processed. The substrate holding part (2) comprises a holding base (21), a plurality of support parts (22), and an outer periphery ring part (23). The holding base (21) is disposed below the substrate (9). Each of the support parts (22) has a plurality of contact parts (224) which come into contact with the outer peripheral edge of the substrate (9) when the substrate (9) is held, and the support parts (22) are arranged in the peripheral direction on the support base (21). The outer peripheral ring part (23) is an annular plate member surrounding the periphery of the substrate (9) with the inner peripheral edge of the outer peripheral ring part (23) being near the outer peripheral edge of the substrate (9). The outer peripheral ring part (23) covers at least some of each of the support parts (22), and at least some of the outer peripheral ring part (23) overlaps with the barrier plate (51) in plan view. It thereby becomes possible to suppress disturbance of airflow in the vicinity of the outer peripheral edge of the substrate (9).
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Inventors:
ANDO KOJI (JP)
Application Number:
PCT/JP2019/022219
Publication Date:
January 09, 2020
Filing Date:
June 04, 2019
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304; H01L21/027; H01L21/306
Foreign References:
| JP2014022558A | 2014-02-03 | |||
| JP2003309102A | 2003-10-31 | |||
| JP2017188665A | 2017-10-12 | |||
| JP2018046063A | 2018-03-22 |
Attorney, Agent or Firm:
MATSUSAKA, Masahiro et al. (JP)
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