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Title:
SUBSTRATE PROCESSING METHOD AND COATING/DEVELOPING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2008/096835
Kind Code:
A1
Abstract:
A processing container of a coating/developing apparatus is provided with an ultraviolet irradiation section for irradiating a substrate with ultraviolet having a wavelength of 120-190nm; a gas supply port for supplying an inert gas; and an exhaust port for exhausting atmosphere in the processing container. The processing container is kept to have atmosphere not containing oxygen atoms and water molecules by supplying the inert gas from the gas supply port and exhausting the atmosphere inside the processing chamber from the exhaust port. Under such atmosphere, the substrate is irradiated with ultraviolet from an ultraviolet irradiating section. At the time of processing the substrate after development, a solvent contained in a resist can be removed without deforming the resist.

Inventors:
MATSUOKA, Takaaki (3-6 Akasaka 5-chome, Minato-k, Tokyo 81, 1078481, JP)
松岡孝明 (〒81 東京都港区赤坂五丁目3番6号 東京エレクトロン株式会社内 Tokyo, 1078481, JP)
INOKUCHI, Atsutoshi (650 Mitsuzawa, Hosaka-cho, Nirasaki-sh, Yamanashi 92, 4070192, JP)
Application Number:
JP2008/052088
Publication Date:
August 14, 2008
Filing Date:
February 01, 2008
Export Citation:
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Assignee:
TOKYO ELECTRON LIMITED (3-6 Akasaka 5-chome, Minato-ku Tokyo, 81, 1078481, JP)
東京エレクトロン株式会社 (〒81 東京都港区赤坂五丁目3番6号 Tokyo, 1078481, JP)
TOHOKU UNIVERSITY (1-1 Katahira 2-chome, Aoba-ku Sendai-sh, Miyagi 77, 9808577, JP)
国立大学法人東北大学 (〒77 宮城県仙台市青葉区片平二丁目1番1号 Miyagi, 9808577, JP)
MATSUOKA, Takaaki (3-6 Akasaka 5-chome, Minato-k, Tokyo 81, 1078481, JP)
International Classes:
H01L21/027; F26B5/04; F26B21/14; G03F7/40; H01L21/02; F26B5/04; F26B21/14; G03F7/40
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (Hazuki International, Shinjuku Akebonobashi Building 1-12, Sumiyoshi-cho, Shinjuku-k, Tokyo 65, 1620065, JP)
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